no code implementations • 11 Feb 2021 • Y. Jin, M. Moreno, P. M. T. Vianez, W. K. Tan, J. P. Griffiths, I. Farrer, D. A. Ritchie, C. J. B. Ford
We present a single-exposure fabrication technique for a very large array of microscopic air-bridges using a tri-layer resist process with electron-beam lithography.
Mesoscale and Nanoscale Physics Materials Science Other Condensed Matter Applied Physics Quantum Physics
