no code implementations • 11 Feb 2021 • Y. Jin, M. Moreno, P. M. T. Vianez, W. K. Tan, J. P. Griffiths, I. Farrer, D. A. Ritchie, C. J. B. Ford
We present a single-exposure fabrication technique for a very large array of microscopic air-bridges using a tri-layer resist process with electron-beam lithography.
Mesoscale and Nanoscale Physics Materials Science Other Condensed Matter Applied Physics Quantum Physics
no code implementations • 28 Dec 2020 • A. Shetty, F. Sfigakis, W. Y. Mak, K. Das Gupta, B. Buonacorsi, M. C. Tam, H. S. Kim, I. Farrer, A. F. Croxall, H. E. Beere, A. R. Hamilton, M. Pepper, D. G. Austing, S. A. Studenikin, A. Sachrajda, M. E. Reimer, Z. R. Wasilewski, D. A. Ritchie, J. Baugh
Unbiased (biased) illuminations are performed at low temperatures on dopant-free two-dimensional electron gases (2DEGs) at different depths in undoped GaAs/AlGaAs, while gates are kept grounded (held at a finite voltage, either positive or negative).
Mesoscale and Nanoscale Physics
