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Found 5 papers, 0 papers with code
GPU-accelerated Matrix Cover Algorithm for Multiple Patterning Layout Decomposition
Multiple patterning lithography (MPL) is regarded as one of the most promising ways of overcoming the resolution limitations of conventional optical lithography due to the delay of next-generation lithography technology.
DiffPattern: Layout Pattern Generation via Discrete Diffusion
Deep generative models dominate the existing literature in layout pattern generation.
DevelSet: Deep Neural Level Set for Instant Mask Optimization
To further enhance printability and fast iterative convergence, we propose a novel deep neural network delicately designed with level set intrinsic principles to facilitate the joint optimization of DNN and GPU accelerated level set optimizer.
Physics-Informed Optical Kernel Regression Using Complex-valued Neural Fields
Lithography is fundamental to integrated circuit fabrication, necessitating large computation overhead.
AdaOPC: A Self-Adaptive Mask Optimization Framework For Real Design Patterns
We inspect the pattern distribution on a design layer and find that different sub-regions have different pattern complexity.
