VLSI Mask Optimization: From Shallow To Deep Learning

16 Dec 2019Haoyu YangWei ZhongYuzhe MaHao GengRan ChenWanli ChenBei Yu

VLSI mask optimization is one of the most critical stages in manufacturability aware design, which is costly due to the complicated mask optimization and lithography simulation. Recent researches have shown prominent advantages of machine learning techniques dealing with complicated and big data problems, which bring potential of dedicated machine learning solution for DFM problems and facilitate the VLSI design cycle... (read more)

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