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Found 10 papers, 3 papers with code
PACE: Pacing Operator Learning to Accurate Optical Field Simulation for Complicated Photonic Devices
In this work, we boost the prediction fidelity to an unprecedented level for simulating complex photonic devices with a novel operator design driven by the above challenges.
Intelligent OPC Engineer Assistant for Semiconductor Manufacturing
Advancements in chip design and manufacturing have enabled the processing of complex tasks such as deep learning and natural language processing, paving the way for the development of artificial general intelligence (AGI).
Differentiable Edge-based OPC
Optical proximity correction (OPC) is crucial for pushing the boundaries of semiconductor manufacturing and enabling the continued scaling of integrated circuits.
LLM-Enhanced Bayesian Optimization for Efficient Analog Layout Constraint Generation
Analog layout synthesis faces significant challenges due to its dependence on manual processes, considerable time requirements, and performance instability.
AnalogCoder: Analog Circuit Design via Training-Free Code Generation
Analog circuit design is a significant task in modern chip technology, focusing on the selection of component types, connectivity, and parameters to ensure proper circuit functionality.
GPU-accelerated Matrix Cover Algorithm for Multiple Patterning Layout Decomposition
Multiple patterning lithography (MPL) is regarded as one of the most promising ways of overcoming the resolution limitations of conventional optical lithography due to the delay of next-generation lithography technology.
DiffPattern: Layout Pattern Generation via Discrete Diffusion
Deep generative models dominate the existing literature in layout pattern generation.
DevelSet: Deep Neural Level Set for Instant Mask Optimization
To further enhance printability and fast iterative convergence, we propose a novel deep neural network delicately designed with level set intrinsic principles to facilitate the joint optimization of DNN and GPU accelerated level set optimizer.
Physics-Informed Optical Kernel Regression Using Complex-valued Neural Fields
Lithography is fundamental to integrated circuit fabrication, necessitating large computation overhead.
AdaOPC: A Self-Adaptive Mask Optimization Framework For Real Design Patterns
We inspect the pattern distribution on a design layer and find that different sub-regions have different pattern complexity.
