no code implementations • 24 Nov 2023 • Yifeng Shao, Sven Weerdenburg, Jacob Seifert, H. Paul Urbach, Allard P. Mosk, Wim Coene
Ptychographic extreme ultraviolet (EUV) diffractive imaging has emerged as a promising candidate for the next-generation metrology solutions in the semiconductor industry, as it can image wafer samples in reflection geometry at the nanoscale.
