no code implementations • 27 Oct 2022 • Mingjie Liu, HaoYu Yang, Zongyi Li, Kumara Sastry, Saumyadip Mukhopadhyay, Selim Dogru, Anima Anandkumar, David Z. Pan, Brucek Khailany, Haoxing Ren
These synthetic mask images will augment the original limited training dataset used to finetune the lithography model for improved performance.